Fujifilm opens cleaners facility

Fujifilm Electronic Materials (FFEM) has begun production at a new building at its site in Oita, Japan. The company said that this will triple capacity for post-CMP cleaners for the manufacture of advanced semiconductors, including those for AI applications. These are used after CMP processes to remove particles, trace metals and organic residues while protecting metal surfaces. 

Between the 2021 and 2024 fiscal years, FFEM saw average growth of about 20%/year and it has invested over ¥100 billion to address this, including for CMP slurries, polyimides and photosensitive dielectric materials for advanced packaging. Further expansions are envisaged as demand continues to grow, driven in part by advances in semiconductor miniaturisation and 3D stacking technologies.